Citation:
Chen, M., Li, X., He, Y., Zheng, H., Cai, Z., Ju, X., Zeng, M., Tong, S. W., Wu, J., Wang, L., Ang, K.-W., & Chi, D. (2025). Wafer-Scale Monolayer MoS2 with Tunable Grain Size via Grain Boundary Engineering for Neuromorphic Computing. ACS Nano, 19(48), 41407–41417. https://doi.org/10.1021/acsnano.5c17643