Backside Metal Interconnect for High Performance RF Interposer

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Backside Metal Interconnect for High Performance RF Interposer
Title:
Backside Metal Interconnect for High Performance RF Interposer
Journal Title:
2025 IEEE 27th Electronics Packaging Technology Conference (EPTC)
Publication Date:
24 February 2026
Citation:
LIM, T. G., Ching, E. W. L., Tippabhotla, S. K., Feng, H., & Wu, J. (2025). Backside Metal Interconnect for High Performance RF Interposer. In (Editor), 2025 IEEE 27th Electronics Packaging Technology Conference (EPTC). https://doi.org/10.1109/eptc67330.2025.11392658
Abstract:
This paper presents a robust integration design for high-power, high-frequency, and high-reliability 2.5D Silicon interposers. The proposed approach utilizes an interface Cu-Mo shim which has high-thermal and electrically conductive and matching CTE between the interposer and the substrate/PCB. The high thermal conductive Cu-Mo helps to provide low thermal resistance path from the interposer backside to the thermal solution in the substrate/PCB. The high electrical conductivity Cu-Mo helps to replace the Ground solder ball and at the same times further improve the thermal performance. The RF transition is designed by optimizing the opening dimension of the Cu-Mo shim for operating frequency up to 50GHz. The matching CTE helps to improve the solder joint reliability of the solder ball by more than 50%.
License type:
Publisher Copyright
Funding Info:
This research / project is supported by the DSO-SHINE - A*STAR
Grant Reference no. : Grant No. I2101E0008
Description:
© 2026 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
ISSN:
979-8-3315-6145-1
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