Liquid Metal Oxide-Assisted Integration of High-k Dielectrics and Metal Contacts for Two-Dimensional Electronics

Liquid Metal Oxide-Assisted Integration of High-k Dielectrics and Metal Contacts for Two-Dimensional Electronics

ACS Nano

10.1021/acsnano.4c08554

https://doi.org/10.1021/acsnano.4c08554

Dasari Venkatakrishnarao, Abhishek Mishra, Yaoju Tarn, Michel Bosman, Rainer Lee, Sarthak Das, Subhrajit Mukherjee, Teymour Talha-Dean, Yiyu Zhang, Siew Lang Teo, Jianwei Chai, Fabio Bussolotti, Kuan Eng Johnson Goh, Chit Siong Lau

18 September 2024

Venkatakrishnarao, D., Mishra, A., Tarn, Y., Bosman, M., Lee, R., Das, S., Mukherjee, S., Talha-Dean, T., Zhang, Y., Teo, S. L., Chai, J., Bussolotti, F., Goh, K. E. J., & Lau, C. S. (2024). Liquid Metal Oxide-Assisted Integration of High-k Dielectrics and Metal Contacts for Two-Dimensional Electronics. ACS Nano, 18(39), 26911–26919. https://doi.org/10.1021/acsnano.4c08554

Two-dimensional van der Waals semiconductors are promising for future nanoelectronics. However, integrating high-k gate dielectrics for device applications is challenging as the inert van der Waals material surfaces hinder uniform dielectric growth. Here, we report a liquid metal oxide-assisted approach to integrate ultrathin, high-k HfO2 dielectric on 2D semiconductors with atomically smooth interfaces. Using this approach, we fabricated 2D WS2 top-gated transistors with subthreshold swings down to 74.5 mV/dec, gate leakage current density below 10–6 A/cm2, and negligible hysteresis. We further demonstrate a one-step van der Waals integration of contacts and dielectrics on graphene. This can offer a scalable approach toward integrating entire prefabricated device stack arrays with 2D materials. Our work provides a scalable solution to address the crucial dielectric engineering challenge for 2D semiconductor-based electronics.

Publisher Copyright

This research / project is supported by the Agency for Science, Technology, and Research - NA
Grant Reference no. : C230917006

This research / project is supported by the Agency for Science, Technology, and Research - Manufacturing, Trade and Connectivity Individual Research Grant
Grant Reference no. : M23M6c0103

This research / project is supported by the Agency for Science, Technology, and Research - Manufacturing, Trade and Connectivity Young Individual Research Grant
Grant Reference no. : M21K3c0124

This research / project is supported by the Agency for Science, Technology, and Research - NA
Grant Reference no. : 21709

This research / project is supported by the National Research Foundation - Competitive Research Programme
Grant Reference no. : CRP21-2018-0094

This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see 10.1021/acsnano.4c08554.

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