Citation:
Chen, M., Chai, J., Wu, J., Zheng, H., Wu, W.-Y., Lourembam, J., Lin, M., Kim, J.-Y., Kim, J., Ang, K.-W., Ng, M.-F., Medina, H., Tong, S. W., & Chi, D. (2024). Sublimation-based wafer-scale monolayer WS2 formation via self-limited thinning of few-layer WS2. Nanoscale Horizons, 9(1), 132–142. https://doi.org/10.1039/d3nh00358b