Sublimation-based wafer-scale monolayer WS2 formation via self-limited thinning of few-layer WS2

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Sublimation-based wafer-scale monolayer WS2 formation via self-limited thinning of few-layer WS2
Title:
Sublimation-based wafer-scale monolayer WS2 formation via self-limited thinning of few-layer WS2
Journal Title:
Nanoscale Horizons
Keywords:
Publication Date:
05 October 2023
Citation:
Chen, M., Chai, J., Wu, J., Zheng, H., Wu, W.-Y., Lourembam, J., Lin, M., Kim, J.-Y., Kim, J., Ang, K.-W., Ng, M.-F., Medina, H., Tong, S. W., & Chi, D. (2024). Sublimation-based wafer-scale monolayer WS2 formation via self-limited thinning of few-layer WS2. Nanoscale Horizons, 9(1), 132–142. https://doi.org/10.1039/d3nh00358b
Abstract:
We present the use of an in situ self-limited thinning of few-layer WS2 formed by the sulfurization of WOx for the growth of wafer-scale fully-covered monolayer WS2. This thinning approach can also be utilized for the preparation of monolayer MoS2.
License type:
Publisher Copyright
Funding Info:
This research / project is supported by the National Research Foundation - Competitive Research Program
Grant Reference no. : NRF-CRP24-2020-0002

This research / project is supported by the A*STAR Science and Engineering Research Council - Ubiquitous Electronics: The Case for Semiconductor 2D Materials
Grant Reference no. : 152-70-00015

This research / project is supported by the A*STAR Science and Engineering Research Council - Ferroelectric Aluminum Scandium Nitride (Al1-xScxN) Thin Films and Devices for mm-Wave and Edge Computing
Grant Reference no. : A20G9b0135

This research / project is supported by the A*STAR - Career Development Fund
Grant Reference no. : C210112032

This research / project is supported by the A*STAR - Advanced Manufacturing and Engineering Young Individual Research Grant (AME YIRG)
Grant Reference no. : A2084c170

This research / project is supported by the A*STAR - SERC Central Research Fund (CRF)
Grant Reference no. :
Description:
ISSN:
2055-6764
2055-6756
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