Measurement and Analysis of Longitudinal and Transversal Effective Piezoelectric Coefficients (d33,f and e31,f) in 100 nm-500 nm Sc0.3Al0.7N films

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Measurement and Analysis of Longitudinal and Transversal Effective Piezoelectric Coefficients (d33,f and e31,f) in 100 nm-500 nm Sc0.3Al0.7N films
Title:
Measurement and Analysis of Longitudinal and Transversal Effective Piezoelectric Coefficients (d33,f and e31,f) in 100 nm-500 nm Sc0.3Al0.7N films
Journal Title:
2023 IEEE International Ultrasonics Symposium (IUS)
Keywords:
Publication Date:
07 November 2023
Citation:
Liu, C., Varghese, B., Liu, P. P., Lin, H., Li, M., & Zhu, Y. (2023, September 3). Measurement and Analysis of Longitudinal and Transversal Effective Piezoelectric Coefficients (d33,f and e31,f) in 100 nm-500 nm Sc0.3Al0.7N films. 2023 IEEE International Ultrasonics Symposium (IUS). https://doi.org/10.1109/ius51837.2023.10306779
Abstract:
High-quality piezoelectric ScAlN thin films with thickness under 500 nm are essential for achieving acoustic filters for 5G and 6G communications. In this work, 8-inch and 30% Sc doped AlN thin films with thickness of 100 nm, 300 nm, and 500 nm have been deposited by single target sputtering. The wafer-level piezoelectric coefficients, including d33,f and e31,f, have been characterized to evaluate the film quality and uniformity of the films. The mean values of the d33,f are 6.07 pm/V, 6.08 pm/V and 6.79 pm/V for 100 nm, 300 nm, and 500 nm films. The mean values of the e31,f are -1.16 C/m 2 , -0.99 C/m 2 , and -1.23 C/m 2 for 100 nm, 300 nm, and 500 nm films. The patterns of the wafer map are discussed with more film characterization results and the possible reasons leading to the observed distribution are further discussed.
License type:
Publisher Copyright
Funding Info:
This research / project is supported by the A*STAR - Ferroelectric Aluminum Scandium Nitride (Al1-xScxN) Thin Films and Devices for mm-Wave and Edge Computing (WP05)
Grant Reference no. : A20G9b0135
Description:
© 2023 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
ISSN:
1948-5727
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