Publication date | Communities | Collections | Article title | Author(s) | Journal/Conference |
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3 Sep 2025 | SERC | Institute of Materials Research and Engineering | Wafer-Scale Integration of Monolayer MoS₂ via Residue-Free Support Layer Etching and Angular Strain Suppression | Shi Wun Tong, Mingxi Chen, Xin Ju, J. W. Chai, Junyoung Kim, Jaewon Kim, Hong Kuan Ng, Benjamin Yue Hao Tan, DongZhi Chi | Nanoscale |