| Publication date | Communities | Collections | Article title | Author(s) | Journal/Conference |
|---|---|---|---|---|---|
| 6 Dec 2024 | SERC | Institute of Microelectronics | Patterning of 1µm Critical Dimension Through Silicon Via using Positive Tone Resist Mask by a Photolithography Stepper | Arvind Sundaram, Riley Kang, Chandra Bhesetti Rao | EPTC 2024: IEEE Electronics Packaging Technology Conference |