Enhancing magnetoresistance and mobility in Co3+xSn2-xS2 via non-stoichiometric doping for fermi level engineering

Page view(s)
0
Checked on
Enhancing magnetoresistance and mobility in Co3+xSn2-xS2 via non-stoichiometric doping for fermi level engineering
Title:
Enhancing magnetoresistance and mobility in Co3+xSn2-xS2 via non-stoichiometric doping for fermi level engineering
Journal Title:
Communications Materials
Keywords:
Publication Date:
14 October 2025
Citation:
Adhikari, D., Salawu, Y. A., Zhou, J., Kshetri, Y. K., Chung, N.-K., Jung, Y. H., & Kim, H.-J. (2025). Enhancing magnetoresistance and mobility in Co3+xSn2-xS2 via non-stoichiometric doping for fermi level engineering. Communications Materials, 6(1). https://doi.org/10.1038/s43246-025-00951-8
Abstract:
Precise tuning of the Fermi level in topological magnetic materials is essential for optimizing electronic properties, yet conventional doping methods often degrade structural integrity and magnetic order. Here, we achieve controlled electron doping in Co3Sn2S2 via non-stoichiometric substitution in Co3+xSn2-xS2 (0 ≤ x ≤ 0.3), preserving the Kagome lattice while enhancing transport properties. This method shifts the Fermi level upward close to the Weyl nodes, leading to a crossover from hole to electron conduction at 2 K. The x = 0.27 sample exhibits a giant transverse magnetoresistance (MR) of 1150% and ultra-high carrier mobility of 18,000 cm²V⁻¹s⁻¹, surpassing conventional magnetic Weyl semimetals. Our findings highlight the role of non-stoichiometric doping in optimizing topological electronic states, positioning Co3+xSn2-xS2 as a promising candidate for spintronic and quantum transport applications.
License type:
Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0)
Funding Info:
There was no specific funding for the research done
Description:
ISSN:
2662-4443
Files uploaded:

File Size Format Action
co3sn2s2.pdf 1.66 MB PDF Open