Material Properties of Sc0.3Al0.7N Thin Films Derived from Electrical Measurements: A Study on Thickness and Temperature Dependence

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Material Properties of Sc0.3Al0.7N Thin Films Derived from Electrical Measurements: A Study on Thickness and Temperature Dependence
Title:
Material Properties of Sc0.3Al0.7N Thin Films Derived from Electrical Measurements: A Study on Thickness and Temperature Dependence
Journal Title:
2025 IEEE International Ultrasonics Symposium (IUS)
Keywords:
Publication Date:
20 October 2025
Citation:
Y. Qian, X. Wang and Y. Zhang, "Material Properties of Sc0.3Al0.7N Thin Films Derived from Electrical Measurements: A Study on Thickness and Temperature Dependence," 2025 IEEE International Ultrasonics Symposium (IUS), Utrecht, Netherlands, 2025, pp. 1-4, doi: 10.1109/IUS62464.2025.11201645.
Abstract:
We present the results of using an electrical method to extract intrinsic thin-film material properties with bulk acoustic wave resonators made from Sc0.3Al0.7N. This approach enables wafer-scale mapping of piezoelectric coefficients, elastic constants, and density. It can be applied to full-wafer material properties characterization, reveal thickness-dependent piezoelectric response and temperature coefficient. This methodology enables high-throughput wafer level characteristics and supports design optimization with wafer level material-property distributions rather than single-point values.
License type:
Publisher Copyright
Funding Info:
This research / project is supported by the A*STAR - Industry Alignment Fund – Industry Collaboration Projects
Grant Reference no. : I2301E0027
Description:
© 2025 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
ISSN:
1948-5727
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