| Publication date | Communities | Collections | Article title | Author(s) | Journal/Conference |
|---|---|---|---|---|---|
| 29 May 2018 | SERC | Institute of Materials Research and Engineering | Plasmonic nanoparticle lithography: Fast resist-free laser technique for large-scale sub-50 nm hole array fabrication | Zhenying Pan, Ye Feng Yu, Vytautas Valuckas, Sherry L. K. Yap, Guillaume G. Vienne, Arseniy I. Kuznetsov | Applied Physics Letters |