| Publication date | Communities | Collections | Article title | Author(s) | Journal/Conference |
|---|---|---|---|---|---|
| 18 May 2017 | SERC | Institute of Materials Research and Engineering | Reconfigurable phase-change photomask for grayscale photolithography | Q. Wang, G. H. Yuan, K. S. Kiang, K. Sun, B. Gholipour, E. T. F. Rogers, K. Huang, S. S Ang, N. I. Zheludev, J. H. Teng | Applied Physics Letters |