| Publication date | Communities | Collections | Article title | Author(s) | Journal/Conference |
|---|---|---|---|---|---|
| 22 Jul 2015 | SERC | Institute of Microelectronics | Deep SiO2 etching with Al and AlN masks for MEMS devices | Vladimir Bliznetsov, Hua Mao Lin, Yue Jia Zhang, David Johnson | Journal of Micromechanics and Microengineering |