Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform

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Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform
Title:
Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform
Journal Title:
Photonics Research
Keywords:
Publication Date:
28 September 2020
Citation:
Xu, Z., Li, N., Dong, Y., Fu, Y. H., Hu, T., Zhong, Q., Zhou, Y., Li, D., Zhu, S., & Singh, N. (2020). Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform. Photonics Research, 9(1), 13. https://doi.org/10.1364/prj.404124
Abstract:
Optical color filters are widely applied in many areas including display, imaging, sensing, holography, energy harvest, and measurement. Traditional dye-based color filters have drawbacks such as environmental hazards and instability under high temperature and ultraviolet radiation. With advances in nanotechnology, structural color filters, which are based on the interaction of light with designed nanostructures, are able to overcome the drawbacks. Also, it is possible to fabricate structural color filters using standard complementary metal-oxide-semiconductor (CMOS) fabrication facilities with low cost and high volume. In this work, metasurface-based subtractive color filters (SCFs) are demonstrated on 12-inch (300-mm) glass wafers using a CMOS-compatible fabrication process. In order to make the transmissive-type SCF on a transparent glass wafer, an in-house developed layer transfer process is used to solve the glass wafer handling issue in fabrication tools. Three different heights of embedded silicon nanopillars (110, 170, and 230 nm) are found to support magnetic dipole resonances. With pillar height and pitch variation, SCFs with different displayed colors are achieved. Based on the resonance wavelength, the displayed color of the metasurface is verified within the red-yellow-blue color wheel. The simulation and measurement results are compared and discussed. The work provides an alternative design for high efficiency color filters on a CMOS-compatible platform, and paves the way towards mass-producible large-area metasurfaces.
License type:
Publisher Copyright
Funding Info:
This research / project is supported by the Agency for Science, Technology and Research - RIE2020 Advanced Manufacturing and Engineering (AME), Programmatic Grant
Grant Reference no. : A18A7b0058
Description:
© 2020 Optica Publishing Group. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.
ISSN:
2327-9125