Development of Large RDL Interposer Package using RDL-first FOWLP Process

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Development of Large RDL Interposer Package using RDL-first FOWLP Process
Title:
Development of Large RDL Interposer Package using RDL-first FOWLP Process
Journal Title:
2023 IEEE 25th Electronics Packaging Technology Conference (EPTC)
Keywords:
Publication Date:
18 March 2024
Citation:
Ho, S. W., Boon Soh, S., Lau, B. L., Hsiang-Yao, H., & Rao, V. S. (2023, December 5). Development of Large RDL Interposer Package using RDL-first FOWLP Process. 2023 IEEE 25th Electronics Packaging Technology Conference (EPTC). https://doi.org/10.1109/eptc59621.2023.10457646
Abstract:
In this work, an organic RDL interposer with large package size of 52 x 44 mm consisting of 12 embedded chiplets on a 60 x 60 mm organic substrate has been demonstrated using RDL- first FOWLP process. 2 field masks stitching was used to create the large interposer package size. 6 layers of high-density Cu RDL have been processed to meet the 12 chiplets interconnectivity and bandwidth performance requirements. Chiplets with micro-bumps were assembled on the RDL with a mass reflow process and encapsulated with mold compound thus forming the RDL interposer package. Electrical testing was conducted on the RDL test structures and the chiplets and results show good electrical continuity across the stitched Cu RDL traces and assembled chiplets. Shadow Moire warpage measurement was performed on the RDL interposer package to characterize the warpage behavior during board assembly. The Shadow Moire results show a large warpage change associated with the large RDL interposer during reflow process. A TCB technique was used to assemble the RDL interposer to the organic build-up substrate, to reduce the package warpage and enable the assembly of the RDL interposer to the organic substrate.
License type:
Publisher Copyright
Funding Info:
This research / project is supported by the A*STAR - Applied Centre of Excellence in Advanced Packaging 3.0. (CEAP 3.0)
Grant Reference no. : I2101E0008
Description:
© 2024 IEEE.  Personal use of this material is permitted.  Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
ISSN:
979-8-3503-2957-5
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