Large-area metasurface on CMOS-compatible fabrication platform: Driving flat optics from lab to fab

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Large-area metasurface on CMOS-compatible fabrication platform: Driving flat optics from lab to fab
Title:
Large-area metasurface on CMOS-compatible fabrication platform: Driving flat optics from lab to fab
Other Titles:
Nanophotonics
Publication Date:
22 April 2020
Citation:
Abstract:
A metasurface is a layer of subwavelength-scale nanostructures that can be used to design functional devices in ultrathin form. Various metasurface-based optical devices – coined as flat optics devices – have been realized with distinction performances in research laboratories using electron beam lithography. To make such devices mass producible at low cost, metasurfaces over a large area have also been defined with lithography steppers and scanners, which are commonly used in semiconductor foundries. This work reviews the metasurface process platforms and functional devices fabricated using complementary metal-oxide-semiconductor- compatible mass manufacturing technologies. Taking both fine critical dimension and mass production into account, the platforms developed at the Institute of Microelectronics (IME), A*STAR using advanced 12-inch immersion lithography have been presented with details, including process flow and demonstrated optical functionalities. These developed platforms aim to drive the flat optics from lab to fab.
License type:
http://creativecommons.org/licenses/by-nc-nd/4.0/
Funding Info:
Funding: RIE2020 Advanced Manufacturing and Engineering (AME) Domain's Core Funds: SERC Strategic Funds (A1818g0028).
Description:
Publisher source: https://www.degruyter.com/view/journals/nanoph/9/10/article-p3071.xml?language=en
ISBN:

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