Reconfigurable phase-change photomask for grayscale photolithography

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Reconfigurable phase-change photomask for grayscale photolithography
Title:
Reconfigurable phase-change photomask for grayscale photolithography
Journal Title:
Applied Physics Letters
Keywords:
Publication Date:
18 May 2017
Citation:
Appl. Phys. Lett. 110, 201110 (2017); https://doi.org/10.1063/1.4983198
Abstract:
We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.
License type:
PublisherCopyrights
Funding Info:
This work was supported by the Engineering and Physical Sciences Research Council [Grant Nos. EP/F040644/1 and EP/M009122/1], the Singapore Ministry of Education [Grant No. MOE2011-T3-1-005], and the Singapore Agency for Science, Technology and Research (A*STAR) [Grant Nos. 1521480031, 1527000014, and 1223600009]. The data from this paper can be obtained from the University of Southampton research repository: http://doi.org/10.5258/SOTON/D0084.
Description:
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Appl. Phys. Lett. 110, 201110 (2017); and may be found at https://doi.org/10.1063/1.49831982017
ISSN:
0003-6951
1077-3118
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