Ultra-compact and broadband Si photonics polarization rotator by self-alignment process

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Ultra-compact and broadband Si photonics polarization rotator by self-alignment process
Title:
Ultra-compact and broadband Si photonics polarization rotator by self-alignment process
Journal Title:
Optics Express
Keywords:
Publication Date:
05 March 2015
Citation:
Haifeng Zhou, Chao Li, Andy Lim Eujin, Lianxi Jia, Mingbin Yu, and Guoqiang Lo, "Ultra-compact and broadband Si photonics polarization rotator by self-alignment process," Opt. Express 23, 6815-6821 (2015)
Abstract:
An ultra-simple polarization rotator is demonstrated on SOI platform with self-aligned process to enhance performance repeatability and manufactural yield. The polarization rotation is essentially achieved by the symmetry breaking of a channel waveguide with a single-sided slab. The two-step lithography enabling this structure is fully compatible with the mainstream process flow of Si photonic integration. A polarization conversion efficiency of 93% is obtained at 1560nm in less than 10μm light propagation length. The merit of flat-band operation (> 100nm) by using asymmetric waveguide for polarization rotation is inherited.
License type:
PublisherCopyrights
Funding Info:
Description:
Full paper can be downloaded from the Publisher's URL provided.
ISSN:
1094-4087
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