Hang Guan, Ari Novack, Matthew Streshinsky, Ruizhi Shi, Qing Fang, Andy Eu-Jin Lim, Guo-Qiang Lo, Tom Baehr-Jones, and Michael Hochberg, "CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler," Opt. Express 22, 2489-2496 (2014)
We present a highly efficient polarization splitter and rotator (PSR), fabricated using 248 nm deep ultraviolet lithography on a silicon-on-insulator substrate. The PSR is based on a double-etched directional coupler with a length of 27 μm. The fabricated PSR yields a TM-to-TE conversion loss better than 0.5 dB and TE insertion loss better than 0.3 dB, with an ultra-low crosstalk (−20 dB) in the wavelength regime 1540-1570 nm.