Optical constant of CoFeB thin film measured with the interference enhancement method

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Optical constant of CoFeB thin film measured with the interference enhancement method
Title:
Optical constant of CoFeB thin film measured with the interference enhancement method
Other Titles:
Applied optics
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Publication Date:
23 February 2015
Citation:
Xinan Liang, Xuewu Xu, Ruitao Zheng, Zhiming Abel Lum, and Jinjun Qiu, "Optical constant of CoFeB thin film measured with the interference enhancement method," Appl. Opt. 54, 1557-1563 (2015)
Abstract:
Optical constants (n and k) of Co20Fe60B20 (CoFeB) thin films (2~40nm) are measured by using interference enhancement method with spectroscopic ellipsometry in the wavelength range of 270~1600nm. The effects of film thickness, protection layer and annealing process on the optical constant of CoFeB film are investigated. In the range of 40~10nm, both n and k decrease with the decrease of thickness. The protection layer of SiO2 on the CoFeB film is helpful for the precise measurement of the n and k values. The annealing process has less effect on the optical constant of the film with the protection layer as compared to the one without it. © 2014 Optical Society of America
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PublisherCopyrights
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Description:
© 2015 Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.
ISSN:
1559-128X
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